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Electrochimica Acta

Volumn 55, Issue 20, 2010, Pages 6081-6087

Facile electrochemical preparation of three-dimensional porous Cu films by potential perturbation

(4) Qiu, Huajun a Lu, Lu a Xue, Luyan a Huang, Xirong a

a SHANDONG UNIVERSITY (China)

Author keywords

Electrocatalytic reduction; H2 template; Potential perturbation

Indexed keywords

BASIC SOLUTIONS; CETYL TRIMETHYL AMMONIUM BROMIDES; CU ATOMS; CU FILMS; CU SUBSTRATE; DENDRITE-LIKE STRUCTURE; DYNAMIC TEMPLATES; ELECTROCATALYTIC ACTIVITY; ELECTROCATALYTIC REDUCTION; ELECTROCHEMICAL PREPARATION; FABRICATION PROCESS; IN-SITU; MICRO-NANO; MICROPORES; PORE FORMATION; POST TREATMENT; POTENTIAL STEPS; SQUARE WAVES; TEMPLATE REMOVAL;

AMMONIUM COMPOUNDS; BROMINE COMPOUNDS; ELECTROCHEMICAL OXIDATION; FABRICATION; FILM PREPARATION; METALLIC FILMS; MICROPOROSITY; REDUCTION; SCANNING ELECTRON MICROSCOPY; SURFACE ACTIVE AGENTS; THREE DIMENSIONAL;

COPPER;

EID: 77954174186 PISSN: 00134686 EISSN: None Source Type: Journal
DOI: 10.1016/j.electacta.2010.05.069 Document Type: Article

Times cited : (29)

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