Relaxation behavior of poly(methyl methacrylate) at a water interface

Journal of Physical Chemistry B

Volumn 114, Issue 10, 2010, Pages 3457-3460

  Fujii, Yoshihisa ^a   Nagamura, Toshihiko ^a   Tanaka, Keiji ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ESTERS; GLASS TRANSITION; RELAXATION PROCESSES; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

APPARENT ACTIVATION ENERGY; CONFINEMENT EFFECTS; DEPTH PROFILE; GLASS TRANSITION TEMPERATURE; INTACT SURFACES; LATERAL FORCE; LATERAL FORCE MICROSCOPY; PMMA FILMS; RELAXATION BEHAVIORS; SCANNING RATE; SEGMENTAL MOTION; WATER INTERFACE; WATER MOLECULE; WATER PHASE;

WATER CONTENT;

POLY(METHYL METHACRYLATE); WATER;

ARTICLE; CHEMISTRY; SURFACE PROPERTY; THERMODYNAMICS; TRANSITION TEMPERATURE;

POLYMETHYL METHACRYLATE; SURFACE PROPERTIES; THERMODYNAMICS; TRANSITION TEMPERATURE; WATER;

EID: 77953949380     PISSN: 15206106     EISSN: 15205207     Source Type: Journal    
DOI: 10.1021/jp909373g     Document Type: Article

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