Optimum electrostatic force control for fabricating a hybrid UV-curable aspheric lens

Journal of Micromechanics and Microengineering

Volumn 20, Issue 7, 2010, Pages

  Hung, Kuo Yung ^a   Chang, Liang Wei ^b   Tseng, Fan Gang ^b,c   Chiou, Jin Chern ^d   Chiu, Yi ^d  

^a MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^c RESEARCH CENTER FOR APPLIED SCIENCES   (Taiwan)

^d NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPHERIC LENS; BOTTOM ELECTRODES; CFD (COMPUTATIONAL FLUID DYNAMICS); ELECTRIC FIELD GRADIENTS; ELECTRODE DESIGN; GENERIC APPROACH; HYBRID STRUCTURE; LENS PROFILES; MICROOPTICAL SYSTEMS; OPTICAL ADHESIVE; OPTICAL TRANSMITTANCE; OPTICS SOFTWARE; SHAPE ERRORS; SPOT SIZES; UV CURABLE;

ASPHERICS; COMPUTATIONAL FLUID DYNAMICS; COMPUTER SOFTWARE; CURING; ELECTRIC FIELDS; ELECTRIC FURNACES; ELECTROSTATIC FORCE; LIGHT REFRACTION; OPTICAL INSTRUMENT LENSES; OPTICAL SYSTEMS; OPTIMIZATION; REFRACTIVE INDEX; REFRACTOMETERS;

ELECTROSTATIC LENSES;

EID: 77953901362     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/20/7/075001     Document Type: Article

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