The role of surface activation prior to seeding on CVD diamond adhesion

Surface and Coatings Technology

Volumn 204, Issue 21-22, 2010, Pages 3585-3591

  Amaral, M ^a   Almeida, F ^b   Fernandes, A J S ^a   Costa, F M ^a   Oliveira, F J ^b   Silva, R F ^b  

^a UNIVERSITY OF AVEIRO   (Portugal)

^b UNIVERSITY OF AVEIRO   (Portugal)

Author keywords

Adhesion; CVD diamond; HFCVD; Nucleation; Surface activation

Indexed keywords

ADHERENT FILMS; AMORPHOUS CARBON LAYER; CERAMIC SURFACE; COLLOIDAL SILICA; CVD DIAMOND; DIAMOND GRAINS; DIAMOND POWDERS; DIAMOND SLURRY; HIGH NUCLEATION DENSITY; HIGH-ADHESION; HOMOGENEOUS FILMS; HOT-FILAMENT; INDENTATION TEST; MECHANICAL ANCHORING; NUCLEATION DENSITIES; SILICON NITRIDE CERAMICS; SPECIAL SURFACES; SURFACE ACTIVATION; SURFACE GROUND; SURFACE PRETREATMENT;

ADHESION; AMORPHOUS CARBON; CERAMIC MATERIALS; DIAMONDS; FILM GROWTH; NUCLEATION; PLASMA ETCHING; SILICA; SILICON NITRIDE; SURFACE ROUGHNESS; ULTRASONIC APPLICATIONS;

CHEMICAL VAPOR DEPOSITION;

EID: 77953722912     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.04.031     Document Type: Article

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