Surface pretreatments of silicon nitride for CVD diamond deposition

Journal of the American Ceramic Society

Volumn 86, Issue 5, 2003, Pages 749-754

  Belmonte, Manuel ^a   Silva, Vitor A ^a   Fernandes, Antonio José ^b   Costa, Florinda ^b   Silva, Rui ^a  

^a Dept of Ceramics and Glass Eng   (Portugal)

^b UNIVERSITY OF AVEIRO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

COLLOIDS; CRYSTAL GROWTH; DIAMONDS; ETCHING; GRAIN SIZE AND SHAPE; MICROWAVES; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLISHING; SILICA; SUBSTRATES;

FILM UNIFORMITY; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION; NUCLEATION DENSITY;

SILICON NITRIDE;

EID: 0037608733     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2003.tb03369.x     Document Type: Article

References (32)

1. 4 Substrates," Diamond Relat. Mater., 9 [3-6] 483-88 (2000).
2. A. J. S. Fernandes, V. A. Silva, J. M. Carrapichano, G. R. Dias, R. F. Silva, and F. M. Costa, "MPCVD Diamond Tool Cutting-Edge Coverage: Dependence on the Side Wedge Angle," Diamond Relat. Mater., 10 [3-7] 803-808 (2001).
3. 4 Substrates on MPCVD Diamond Deposition," Surf. Coat. Technol., 151-152, 521-25 (2002).
4. P. K. Bachmann, D. Leers, and D. U. Wiechert, "Diamond Thin Films: Preparation, Characterization and Selected Applications," Ber. Bunsenges. Phys. Chem., 95 [11] 1390-400 (1991).
5. C. L. Chang and M. P. Guidoboni, "Effects of Surface Treatment on the Diamond Deposition and Performance of Ceramic Cutting Tools," Surf. Coat. Technol., 49, [1-3] 366-69 (1991).
6. R. C. McCune, R. E. Chase, and E. L. Cartwright, "Methodology for Adhesion Characterization of Microwave PECVD Diamond Films on Sialon Tool Inserts," Surf. Coat. Technol., 53 [2] 189-97 (1992).
7. I. Reineck, S. Soderberg, P. Ekholm, and K. Westergren, "Chemically Vapor Deposited Diamond as a Cutting Tool Material - A Study of Failure Mechanisms," Surf. Coat. Technol., 57 [1] 47-50 (1993).
8. X. L. Peng, H. F. Liu, Z. P. Gan, H. Q. Li, and H. D. Li, "Characterization and Adhesion Strength of Diamond Films Deposited on Silicon Nitride Inserts by D. C. Plasma Jet Chemical Vapour Deposition," Diamond Relat. Mater. 4, 1260-66 (1995).
9. E. Cappelli, F. Pinzari, P. Ascarelli, and G. Righini, "Diamond Nucleation and Growth on Different Cutting Tool Materials: Influence of Substrate Pre-Treatments," Diamond Relat. Mater., 5 [3-5] 292-98 (1999).
10. I. Endler, A. Leohardt, H.-J. Sceibe, and R. Born, "Interlayers for Diamond Deposition on Tool Materials," Diamond Relat. Mater., 5, 299-303 (1996).
11. H. Itoh, S. Shimura, K. Sugiyama, H. Iwaharara, and H. Sakamoto, "Adherent Diamond Coating on Silicon Nitride Substrate," J. Ceram. Soc. Jpn., 104 [12] 1137-42 (1996).
12. H. Itoh, S. Shimura, K. Sugiyama, H. Iwahara, and H. Sakamoto, "Improvement of Cutting Performance of Silicon Nitride Tool by Adherent Coating of Thick Diamond Film," J. Am. Ceram. Soc., 80 [1] 189-96 (1997).
13. 4 Substrate," Diamond Relat. Mater., 6, 411-16 (1997).
14. H. Buchkremer-Hermanns, H. Ren, G. Kohlschein, and H. Weiss, "Nucleation and Early Growth of CVD Diamond on Silicon Nitride," Surf. Coat. Technol., 98 [1-3] 1038-46 (1998).
15. 4 Based Ceramics," Surf. Coat. Technol., 106 [1] 66-71 (1998).
16. R. T. Rozbicki and V. K. Sarin, "Nucleation and Growth of Combustion Flame Deposited Diamond on Silicon Nitride," Int. J. Refract. Met. Hard Mater., 16, 377-88 (1998).
17. H. Itoh, S. Lee, K. Sugiyama, H. Iwahara, and T. Tsutsumoto, "Adhesion Improvement of Diamond Coating on Silicon Nitride Substrate," Surf. Coat. Technol., 112 [1-3] 199-203 (1999).
18. J. Zhou, R. Yuan, W. Yu, J. Wang, and G. Liu, "Deposition of Diamond Film on Silicon Nitride Tools by MPCVD," J. Synth. Cryst., 29, 300 (2000).
19. K. Mallika and R. Komanduri, "Low Pressure Microwave Plasma Assisted Chemical Vapor Deposition (MPCVD) of Diamond Coatings on Silicon Nitride Cutting Tools," Thin Solid Films, 396, 145-65 (2001).
20. V. G. Ralchenko, A. A. Smolin, V. G. Perevezev, E. D. Obraztsova, K. G. Korotoushenko, V. I. Konov, Y. V. Lakhotkin, and E. N. Loubnin, "Diamond Deposition on Steel with CVD Tungsten Intermediate Layer," Diamond Relat. Mater., 4, 754-58 (1995).
21. M. Nesládek, K. Vandierendonck, C. Quaeyhaegens, M. Kerkhofs, and L. M. Stals, "Adhesion of Diamond Coatings on Cemented Carbides," Thin Solid Films, 270, 184-88 (1995).
22. V. Buck and F. Deuerler, "Enhanced Nucleation of Diamond Films on Pretreated Substrates," Diamond Relat. Mater., 7 [10] 1544-52 (1998).
23. K. Mallika and R. Komanduri, "Diamond Coatings on Cemented Tungsten Carbide Tools by Low-Pressure Microwave CVD," Wear, 224, 245-66 (1999).
24. D. Lee, J. M. Fitz-Gerald, and R. K. Singh, "Novel Method for Adherent Diamond Coatings on Cemented Carbide Substrates," Surf. Coat. Technol., 101 [1-3] 187-91 (1998).
25. S. T. Lee, Z. Lin, and X. Jiang, "CVD Diamond Films: Nucleation and Growth," Mater. Sci. Eng. R, 25 [4] 123-54 (1999).
26. T. Epicier and G. Orange, "Electron Microscopy Study of the Microstructure of a Hot-Pressed Silicon Nitride," Ceram. Int., 8 [4] 154-58 (1982).
27. M. Sugawara, "Plasma Etching: Fundamentals and Applications"; p. 95 in Series on Semiconductor Science and Technology, 7. Oxford University Press, New York, 1998.
28. S. Bandyophadhyay and J. Mukerji, "Sintering and Properties of Sialons without Externally Added Liquid Phase," J. Am. Ceram. Soc., 70 [10] C-273-C-277 (1987).
29. S. Kamiya, M. Sato, and M. Saka, "Fracture Toughness Estimation of Thin Chemical Vapor Deposition Diamond Films Based on the Spontaneous Fracture Behavior on Quartz Glass Substrates," J. Appl. Phys., 82 [12] 6056-61 (1997).
30. A. Fernandes, A. Neves, R. F. Silva, and M. H. Nazaré, "Evaluation of MPCVD Diamond Film Adhesion on Hard Metal Substrates by Micro Raman Spectroscopy," Diamond Relat. Mater., 6, 769-73 (1997).
31. A. R. Badzian and T. Badzian, "Nucleation and Growth Phenomena in Chemically Vapor-Deposited Diamond Coatings," Surf. Coat. Technol., 36 [1-2] 283-93 (1988).
32. B. Lux, and R. Haubner, "Diamond and Diamond-like Films and Coatings"; in NATO-ANSI, Series B: Physics. 579-609 Edited by R. E. Clausing. Plenum, New York, 1991.