Doping of polythiophene by microwave plasma deposition

Surface and Coatings Technology

Volumn 204, Issue 18-19, 2010, Pages 3053-3058

  Paosawatyanyong, Boonchoat ^a,b   Kamphiranon, Phensupa ^a   Bannarakkul, Wanna ^a   Srithana anant, Yongsak ^a   Bhanthumnavin, Worawan ^a  

^a CHULALONGKORN UNIVERSITY   (Thailand)

^b THAILAND CENTER OF EXCELLENCE IN PHYSICS   (Thailand)

Author keywords

Electrical conductivity; In situ doping; Microwave; Plasma polymerization; Polythiophene

Indexed keywords

DOPED MATERIALS; DOPED POLYTHIOPHENE; EFFICIENT METHOD; ELECTRICAL CONDUCTIVITY; ENERGY DISPERSIVE X-RAY; EX SITU; HIGH UNIFORMITY; IN-SITU; IN-SITU DOPING; MICROWAVE PLASMA; MICROWAVE PLASMA POLYMERIZATION; MICROWAVE PLASMA SYSTEMS; PLASMA POLYMERIZED FILM; POLY-THIOPHENE; POLYTHIOPHENE FILMS; SCANNING ELECTRON MICROSCOPIC; SPECTROSCOPIC METHOD; ULTRAVIOLET-VISIBLE SPECTRA;

CHEMICAL VAPOR DEPOSITION; CONDUCTIVE FILMS; DEPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; INDUSTRIAL CHEMICALS; INFRARED SPECTROSCOPY; IODINE; MICROWAVES; PLASMA DEPOSITION; PLASMAS; POLYMERS; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ANALYSIS; X RAY SPECTROSCOPY;

PLASMA POLYMERIZATION;

EID: 77953357420     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.02.066     Document Type: Article

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