Stage position measurement for e-beam lithography tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  Harris, Paul G ^a   Lee, William ^b   McClelland, Andrew W ^a   Tingay, John M ^a  

^a Vistec Lithography Ltd   (United Kingdom)

^b RENISHAW PLC   (United Kingdom)

Author keywords

Electron beam lithography; Interferometry; Stage measurement

Indexed keywords

GAUSSIAN BEAMS; INTEGRATION; INTERFEROMETRY; POSITION MEASUREMENT;

GAUSSIAN ELECTRON BEAMS; LITHOGRAPHY TOOLS; STAGE MEASUREMENT;

ELECTRON BEAM LITHOGRAPHY;

EID: 35148877245     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711452     Document Type: Conference Paper

References (4)

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2. Lee W: Recent developments in homodyne interferometry, ASPE Technical Conference 2004
3. E Kratschmer et al 1998 J. Vac. Sci. Technol. B 6 2074
4. S A Rishton et al 1984 J. Phys. E: Sci. Instrum. 17 296-303