Analysis and fabrication of antireflection coating with ultralow residual reflectance for single wavelength

Chinese Optics Letters

Volumn 8, Issue SUPPL., 2010, Pages 207-209

  Liu, Huasong ^a,b   Ji, Yiqin ^b,c   Wang, Zhanshan ^a   Chen, Deying ^c   Liu, Dandan ^b   Wang, Ri ^b   Shen, Zhengxiang ^a   Ma, Bin ^a   Jiang, Fuhao ^d  

^a TONGJI UNIVERSITY   (China)

^b TIANJIN JINHANG INSTITUTE OF TECHNICAL PHYSICS   (China)

^c HARBIN INSTITUTE OF TECHNOLOGY   (China)

^d INSTITUTE OF AUTOMATION   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION; AR COATINGS; CENTER WAVELENGTH; DOUBLE LAYER STRUCTURE; DOUBLE LAYERS; HIGH-PRECISION; ION-BEAM SPUTTERING; LASER MEASUREMENT SYSTEMS; PERFORMANCE REQUIREMENTS; RESIDUAL REFLECTANCE; SILICA SUBSTRATE; SINGLE WAVELENGTH; STANDARD SYSTEM;

COATINGS; REFLECTION; SILICA; SPUTTERING; STANDARDIZATION; TANTALUM;

ANTIREFLECTION COATINGS;

EID: 77953252437     PISSN: 16717694     EISSN: None     Source Type: Journal    
DOI: 10.3788/COL201008S1.0207     Document Type: Article

References (6)

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