Solvent-free polymer lithography via the Kirkendall effect

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 268, Issue 11-12, 2010, Pages 2181-2184

  Thompson, Richard L ^a  

^a DURHAM UNIVERSITY   (United Kingdom)

Author keywords

Diffusion; Kirkendall; Lithography; Polymer; Proton beam writing

Indexed keywords

ALTERNATIVE ROUTES; CHAIN SCISSION; DIFFUSION COEFFICIENTS; GLASS TRANSITION TEMPERATURE; IRRADIATED MATERIALS; KIRKENDALL; KIRKENDALL EFFECTS; MICRON SCALE; POTENTIAL APPLICATIONS; PROTON BEAM WRITING; RADIATION-INDUCED; SOLVENT BASED; SOLVENT FREE; SURROUNDING MATERIALS; VIRGIN MATERIALS;

DIFFUSION; DISSOLUTION; GLASS TRANSITION; MOLECULAR WEIGHT; POLYMERS; PROTON BEAMS; PROTONS; SOLVENTS;

ION BEAM LITHOGRAPHY;

EID: 77953132130     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2010.02.083     Document Type: Article

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