Effect of dielectric barrier discharge on semiconductor Si electrode surface

Applied Surface Science

Volumn 256, Issue 20, 2010, Pages 6047-6052

  Wang, Changquan ^a   Zhang, Guixin ^a   He, Xiangning ^b  

^a TSINGHUA UNIVERSITY   (China)

^b ZHEJIANG UNIVERSITY   (China)

Author keywords

Air plasma; Dielectric barrier discharge; Power supply; Semiconductor electrode

Indexed keywords

ALUMINUM NITRIDE; ATMOSPHERIC PRESSURE; CHEMICAL ANALYSIS; DIELECTRIC DEVICES; DIELECTRIC MATERIALS; ELECTRODES; FLOW CONTROL; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SINGLE CRYSTALS; SURFACE REACTIONS; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

AIR PLASMAS; ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGES; DIELECTRIC BARRIER DISCHARGES; DIFFERENT ANALYSIS TECHNIQUES; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; HIGH VOLTAGE ELECTRODES; POWER SUPPLY; SEMICONDUCTOR ELECTRODE;

ELECTRIC DISCHARGES;

EID: 77953130099     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.03.117     Document Type: Article

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