Physical and electrical properties of SiO2 layer synthesized by eco-friendly method

Japanese Journal of Applied Physics

Volumn 49, Issue 5 PART 2, 2010, Pages

  Kim, Jong Woong ^a   Kim, Young Seok ^a   Hong, Sung Jei ^a   Hong, Tae Hwan ^b   Han, Jeong In ^a  

^a Korea Electronic Technology Institute (KETI)   (South Korea)

^b Chungju National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ECO-FRIENDLY; ELECTRICAL PROPERTY; FEASIBILITY TESTING; GLASS SUBSTRATES; HEAT TREATMENT TEMPERATURE; INSULATION LAYERS; INSULATION RESISTANCE; MICRO-ELECTRONIC DEVICES; SYNTHETIC PROCESS;

DIGITAL PRINTING; ELECTRIC PROPERTIES; ENVIRONMENTAL PROTECTION; FLAT PANEL DISPLAYS; MICROELECTRONICS; NANOPARTICLES; ORGANIC SOLVENTS; PASSIVATION; PRINTING PRESSES; SUBSTRATES; SYNTHESIS (CHEMICAL);

SILICON COMPOUNDS;

EID: 77952962777     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.05EA02     Document Type: Article

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