ZnO films with very high haze value for use as front transparent conductive oxide films in thin-film silicon solar cells

Applied Physics Express

Volumn 3, Issue 5, 2010, Pages

  Hongsingthong, Aswin ^a   Krajangsang, Taweewat ^a   Yunaz, Ihsanul Afdi ^a   Miyajima, Shinsuke ^a   Konagai, Makoto ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTING GLASS; FILM DEPOSITION; HYDROGENATED MICROCRYSTALLINE SILICON; LONG WAVELENGTH; METALORGANIC CHEMICAL VAPOR DEPOSITION; MULTI-TEXTURE; RMS ROUGHNESS; SUBSTRATE ETCHING; THIN-FILM SILICON SOLAR CELLS; TRANSPARENT CONDUCTIVE OXIDE FILMS; TREATMENT TIME; ZNO; ZNO FILMS;

CONDUCTIVE FILMS; GLASS; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROCRYSTALLINE SILICON; ORGANIC CHEMICALS; SILICON SOLAR CELLS; SOLAR CELLS; TEXTURES; ZINC; ZINC OXIDE;

OXIDE FILMS;

EID: 77952770026     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.3.051102     Document Type: Article

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