A novel five-photo-mask low-temperature polycrystalline-silicon CMOS structure

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 2009, Pages

  Lee, Sang Jin ^a   Lee, Seok Woo ^a   Oh, Kum Mi ^a   Lee, Kyung Eon ^a   Yang, Myoung Su ^a   Hwang, Yong Kee ^a  

^a LG Display Co Ltd   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE MATRIX LIQUID CRYSTAL DISPLAYS; CMOS PROCESSS; CMOS STRUCTURES; CMOS TECHNOLOGY; COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; CONTACT BARRIER; FORMATION PROCESS; INDIUM TIN OXIDE; LOW TEMPERATURE POLYCRYSTALLINE SILICON; LOW TEMPERATURES; POLY-SI; POLYCRYSTALLINE; SILICON CMOS; TEST SAMPLES;

ELECTRON DEVICES; LIQUID CRYSTAL DISPLAYS; LIQUID CRYSTALS; METALLIC COMPOUNDS; MOS DEVICES; POLYSILICON; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; THIN FILM TRANSISTORS; TIN; TITANIUM COMPOUNDS;

CMOS INTEGRATED CIRCUITS;

EID: 77952409096     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.2009.5424393     Document Type: Conference Paper

References (5)

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