Electrochemical intercalation of O 2- in CuAlO 2 single crystal and photoelectrochemical properties

Journal of Solid State Electrochemistry

Volumn 14, Issue 7, 2010, Pages 1333-1338

  Brahimi, Razika ^a,b   Trari, Mohamed ^b   Bouguelia, Aïssa ^b   Bessekhouad, Yassine ^b  

^a CENTRE DE RECHERCHE SCIENTIFIQUE ET TECHNIQUE EN ANALYSES PHYSICO CHIMIQUES CRAPC   (Algeria)

^b UNIVERSITY OF SCIENCES AND TECHNOLOGY HOUARI BOUMEDIENE   (Algeria)

Author keywords

CuAlO 2; Delafossite; Diffusion; Oxygen intercalation; Photoelectrochemical; Single crystal

Indexed keywords

ABSORPTION COEFFICIENTS; CUALO 2; DELAFOSSITES; DIFFUSION COEFFICIENTS; DIFFUSION LENGTH; ELECTROCHEMICAL INTERCALATIONS; FLAT BAND POTENTIAL; FLUX METHODS; GARTNER; HOLE DIFFUSION; LOW MOBILITY; MOTT-SCHOTTKY PLOTS; OXYGEN INTERCALATION; P TYPE SEMICONDUCTOR; PENETRATION DEPTH; PHOTOCURRENT SPECTRUM; PHOTOELECTROCHEMICAL PROPERTIES; PHOTOELECTROCHEMICALS; SATURATED CALOMEL ELECTRODE; SPECTRAL PHOTORESPONSE; THERMAL VARIATION; TO A VERY LARGE;

ABSORPTION; CHRONOAMPEROMETRY; COPPER COMPOUNDS; HOLE MOBILITY; OXYGEN; SINGLE CRYSTALS;

DIFFUSION;

EID: 77952241897     PISSN: 14328488     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10008-009-0935-x     Document Type: Article

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