|
|
Volumn 100, Issue 9, 2009, Pages 1234-1238
|
|
Electrophoresis deposition of metal nanoparticles with reverse micelles onto InP
a
|
|
Author keywords
Electrophoresis; InP; Nanoparticles; Schottky barrier
|
|
Indexed keywords
CAPACITANCE VOLTAGE CHARACTERISTIC;
COLLOID SOLUTIONS;
ELECTROPHORESIS DEPOSITION;
HIGH VACUUM;
INP;
INP WAFERS;
MERCURY PROBE;
METAL NANOPARTICLES;
NANO LAYERS;
NEGATIVE POTENTIAL;
ON-WAFER;
PALLADIUM NANOPARTICLES;
POSITIVE POTENTIAL;
RECTIFYING PROPERTIES;
REVERSE MICELLES;
SCHOTTKY;
SCHOTTKY BARRIER;
SCHOTTKY BARRIERS;
SECONDARY-ION MASS SPECTROSCOPY;
SINGLE CRYSTAL WAFERS;
ATOMIC FORCE MICROSCOPY;
ATOMIC SPECTROSCOPY;
DIODES;
DISTILLATION;
ELECTROPHORESIS;
MASS SPECTROMETRY;
MERCURY (METAL);
MICELLES;
NANOPARTICLES;
PALLADIUM;
SCHOTTKY BARRIER DIODES;
SINGLE CRYSTAL SURFACES;
CURRENT VOLTAGE CHARACTERISTICS;
|
|
EID: 77952041355
PISSN: 18625282
EISSN: None
Source Type: Journal
DOI: 10.3139/146.110178 Document Type: Article |
|
Times cited : (10)
|
|
References (8)
|
