Patterned poly(2-hydroxyethyl methacrylate) brushes on silicon surfaces behave as "tentacles" to capture ferritin from aqueous solution

ACS Applied Materials and Interfaces

Volumn 1, Issue 7, 2009, Pages 1525-1532

  Chen, Jem Kun ^a   Chen, Zong Yan ^a   Lin, Han Ching ^b   Hong, Po Da ^a   Chang, Feng Chih ^c  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^c NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

ferritin; patterned PHEMA brush; VLSI process

Indexed keywords

2-HYDROXYETHYL METHACRYLATE; AQUEOUS SOLUTIONS; ATOM TRANSFER; COVALENTLY BONDED; FERRITIN; FERRITIN IRON; FERRITIN PROTEIN; GRAFT POLYMERIZATION; HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPIES; PATTERN RESOLUTION; PATTERNED PHEMA BRUSH; PATTERNED SURFACE; POLY(2-HYDROXYETHYL METHACRYLATE); SI SURFACES; SI(100) SURFACE; SILICON SURFACES; THERMAL REMOVAL; VERY LARGE-SCALE INTEGRATION; VLSI PROCESS;

BIOMATERIALS; BRUSHES; FREE RADICAL REACTIONS; HIGH RESOLUTION ELECTRON MICROSCOPY; POLYMERIZATION; POLYMERS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SOLUTIONS;

ATOM TRANSFER RADICAL POLYMERIZATION;

2 HYDROXYETHYL METHACRYLATE; CYCLOHEXANE; CYCLOHEXANE DERIVATIVE; FERRITIN; METHACRYLIC ACID DERIVATIVE; PROTEIN; SILICON; SOLVENT; WATER;

ADSORPTION; ARTICLE; CHEMICAL MODEL; CHEMISTRY; METHODOLOGY; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY; TIME;

ADSORPTION; CYCLOHEXANES; FERRITINS; METHACRYLATES; MICROSCOPY, ELECTRON, SCANNING; MODELS, CHEMICAL; PROTEINS; SILICON; SOLVENTS; SURFACE PROPERTIES; TIME FACTORS; WATER;

EID: 77951646787     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am900190c     Document Type: Article

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