High resolution measurement of FGM thin films using picosecond ultrasonics

Physics Procedia

Volumn 3, Issue 1, 2010, Pages 727-733

  Aebi, L ^a   Schwank, L ^b   Vollmann, J ^b   Bryner, J ^b   Wenke, I ^b   Dual, J ^b  

^a Institute of Mechanical Systems (IMES)   (Switzerland)

^b NONE

Author keywords

FGM; Filter; Frequency; Grading; Laser; Material property; Picosecond ultrasonics; Wave propagation

Indexed keywords

ACOUSTIC IMPEDANCE; ACOUSTICS; FUNCTIONALLY GRADED MATERIALS; GRADING; LASERS; MATERIALS PROPERTIES; MECHANICAL WAVES; PHYSICAL VAPOR DEPOSITION; PUMPING (LASER); RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR LASERS; ULTRASONICS; WAVE PROPAGATION;

FILTER; FINITE-DIFFERENCE ALGORITHMS; FREQUENCY; HIGH FREQUENCY FILTERS; HIGH-RESOLUTION MEASUREMENTS; MICRO AND NANOSTRUCTURES; PICOSECOND ULTRASONICS; SEMICONDUCTOR MANUFACTURING;

INTERFACES (MATERIALS);

EID: 77951613035     PISSN: 18753884     EISSN: 18753892     Source Type: Conference Proceeding    
DOI: 10.1016/j.phpro.2010.01.092     Document Type: Conference Paper

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