SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 200, Issue 5-6, 2005, Pages 1664-1668

Amorphization of Ta-Al films using magnetron sputtering

(2) Su, P J a Chung, C K a

a NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

Author keywords

Amorphization; Heater; Inkjet; Sputtering; Ta Al

Indexed keywords

AMORPHIZATION; AMORPHOUS ALLOYS; COMPOSITION EFFECTS; CRYSTAL MICROSTRUCTURE; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; MORPHOLOGY; POLYCRYSTALLINE MATERIALS; SURFACE ROUGHNESS; TANTALUM ALLOYS;

COMPOSITION RATIO EFFECT; HEATER; INKJET;

AMORPHOUS FILMS;

COATING;

EID: 28944445096 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.08.100 Document Type: Article

Times cited : (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.