Rapid Cu(In,Ga)Se2 growth using "end point detection"

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn 2000-January, Issue , 2000, Pages 509-512

  Kessler, J ^a   Scholdstrom J ^a   Stolt, L ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; EVAPORATION; GALLIUM; PROCESS CONTROL; SEMICONDUCTING SELENIUM COMPOUNDS; THIN FILMS;

DEPOSITION PROCESS; END POINT DETECTION; EVAPORATION RATE; FILM COMPOSITION; HIGH EVAPORATION RATE; RADIATIVE BEHAVIOR; SUBSTRATE HEATERS; SUBSTRATE TEMPERATURE;

COPPER;

EID: 77951535230     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2000.915883     Document Type: Conference Paper

References (11)

1. W.S. Chen, and R.A. Mickelsen, SPIE Proceedings 248 (1980) p. 62
2. J.R. Tuttle, M. Contreras, A. Tennant, R. Matson, A. Duda, J. Carapella, D. Albin, and R. Noufi, AIP Conference Proceedings 268 (1992) p. 186
3. R. Klenk, T. Walter, H.W. Schock, and D. Cahen, Advanced Materials 5 (1993) p. 114
4. M. Nishitani, T. Negami, T. Wada, Thin Solid Films 258 (1995) p. 313
5. N. Kohara, T. Negami, M. Nishitani, T. Wada, Jpn. J. Appl. Phys., Vol. 34, No 9A (1995) p. 1141
6. T. Negami, M. Nishitani, N. Kohara, Y. Hashimoto, T. Wada, Mat. Res. Soc. Symp. Proc. Vol. 426 (1996) p. 267
7. th IEEE PVSC, Anaheim (1997) p. 331
8. L. Stolt, J. Hedström, J. Kessler, M. Ruckh, K.O. Veithaus, H.W. Schock, Appl. Phys. Lett. 62 (6) (1993)p.597
9. K. Mitchell, C. Eberspacher, J. Ermer, K. Pauls, D. Pier, IEEE Trans. On Electron Devices, Vol 37, No 2 (1990) p. 410
10. th IEEE PVSC, Washington (1995) p. 813
11. th EU PVSEC, Glasgow (2000)