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Volumn , Issue , 2009, Pages 228-231

Statistical approach to low power and high volume pineview atom-based SoC design

Author keywords

Component; Low power; SoC; Statistical; Yields

Indexed keywords

DESIGN TEAM; FABRICATION PROCESS; HIGH YIELD; IP BLOCK; LOW POWER; POST-SILICON; POWER MODEL; PROCESS VARIATION; SOC DESIGNS; STATISTICAL APPROACH; STATISTICAL DESIGN; SUBMICRON;

EID: 77951437821     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SOCDC.2009.5423804     Document Type: Conference Paper
Times cited : (1)

References (3)
  • 1
    • 66649124356 scopus 로고    scopus 로고
    • Managing Process Variation in Intel's 45nm CMOS Process
    • Kelin Kuhn, et al., "Managing Process Variation in Intel's 45nm CMOS Process", Intel Technology Journal (ITJ), Volumn 12, Issue 2, 2008, p93-109
    • (2008) Intel Technology Journal (ITJ) , vol.12 , Issue.2 , pp. 93-109
    • Kuhn, K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.