The effect of magnetic fields on the electroless deposition of Co-W-P film

Surface and Coatings Technology

Volumn 204, Issue 16-17, 2010, Pages 2669-2676

  Yu, Yundan ^a   Wei, Guoying ^a   Hu, Xiukun ^a   Ge, Hongliang ^a   Yu, Zhou ^a  

^a CHINA JILIANG UNIVERSITY   (China)

Author keywords

Co W P thin films; Magnetic electroless deposition; Magnetic properties; Microstructure; Ultrasonic

Indexed keywords

ALKALINE BATHS; ATOMIC PERCENTAGE; CO-W-P THIN FILMS; COERCIVITIES; COPPER SUBSTRATES; CRYSTALLOGRAPHIC ORIENTATIONS; DEPOSITED FILMS; EFFECT OF MAGNETIC FIELD; ELECTROLESS DEPOSITION; ELECTROLESS DEPOSITION PROCESS; MAGNETIC ELECTROLESS DEPOSITION; MAGNETIC FORCE; MAGNETIC INTENSITIES; MAGNETIC PROPERTIES OF CO; MICRO-MHD; NEEDLE-LIKE STRUCTURE; PH VALUE;

COERCIVE FORCE; DEPOSITION; MAGNETIC FIELDS; MAGNETIC MATERIALS; MICROSTRUCTURE; PH EFFECTS; THIN FILMS; ULTRASONICS;

COBALT;

EID: 77951298747     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.02.020     Document Type: Article

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