CMOS compatible contacts and etching for InP-on-silicon active devices

IEEE International Conference on Group IV Photonics GFP

Volumn , Issue , 2009, Pages 196-198

  Grenouillet, L ^a   Bavencove, A L ^a   Dupont, T ^a   Harduin, J ^a   Philippe, P ^a   Regreny, P ^b   Lelarge, F ^c   Gilbert, K ^a   Grosse, P ^a   Fedeli, J M ^a  

^a CEA LETI   (France)

^b INSTITUT DES NANOTECHNOLOGIES DE LYON   (France)

^c ALCATEL THALES III V LAB   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE DEVICES; CMOS COMPATIBLE; CONTINUOUS WAVE; ETCHED FACET; INP; NONALLOYED OHMIC CONTACT;

OHMIC CONTACTS; PLASMA ETCHING;

CMOS INTEGRATED CIRCUITS;

EID: 77951076124     PISSN: 19492081     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/GROUP4.2009.5338397     Document Type: Conference Paper

References (7)

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