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Volumn , Issue , 2010, Pages 204-207

RF power potential of 45 nm CMOS technology

Author keywords

[No Author keywords available]

Indexed keywords

65-NM DEVICES; CMOS DEVICES; CMOS TECHNOLOGY; MAXIMUM OSCILLATION FREQUENCY; OPERATING FREQUENCY; PEAK OUTPUT POWER; PEAK POWER; RF POWER PERFORMANCE; RF-POWER;

EID: 77951048141     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SMIC.2010.5422960     Document Type: Conference Paper
Times cited : (26)

References (8)
  • 4
    • 70350241491 scopus 로고    scopus 로고
    • 60GHz 45nm PA for Linear OFDM Signal with Predistortion Correction achieving 6.1% PAE and -28dB EVM
    • E. Cohen, et al, "60GHz 45nm PA for Linear OFDM Signal with Predistortion Correction achieving 6.1% PAE and -28dB EVM", Radio Frequency Integrated Circuits Symposium, 2009, pp. 35-38.
    • Radio Frequency Integrated Circuits Symposium, 2009 , pp. 35-38
    • Cohen, E.1
  • 5
    • 41149141949 scopus 로고    scopus 로고
    • A 45nm low cost low power platform by using integrated dual-stress-liner technology
    • J. Yuan, et al, "A 45nm low cost low power platform by using integrated dual-stress-liner technology", VLSI technology symposium, 2006, pp. 100-101.
    • VLSI Technology Symposium, 2006 , pp. 100-101
    • Yuan, J.1
  • 6
    • 70350234891 scopus 로고    scopus 로고
    • Effect of substrate contact shape and placement on RF characteristics of 45 nm low-power CMOS devices
    • U. Gogineni, et al, "Effect of substrate contact shape and placement on RF characteristics of 45 nm low-power CMOS devices", Radio Frequency Integrated Circuits Symposium, 2009, pp. 163-166.
    • Radio Frequency Integrated Circuits Symposium, 2009 , pp. 163-166
    • Gogineni, U.1
  • 8
    • 46049112721 scopus 로고    scopus 로고
    • Fundamental power and frequency limits of deeply-scaled CMOS for RF power applications
    • J. Scholvin, et al, "Fundamental power and frequency limits of deeply-scaled CMOS for RF power applications", International Electron Device Meeting, 2006, pp. 217-220.
    • International Electron Device Meeting, 2006 , pp. 217-220
    • Scholvin, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.