Dielectric properties of PMMA-SiO2 hybrid films

Materials Science Forum

Volumn 644, Issue , 2010, Pages 25-28

  Morales Acosta, M D ^a   Quevedo Lopez, M A ^b   Alshareef, H N ^c   Gnade, B ^b   Ramirez Bon, R ^a  

^a DEPARTAMENTO DE FÍSICA   (Mexico)

^b The University of Texas at Dallas   (United States)

^c KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Saudi Arabia)

Author keywords

Capacitor; Flexible electronics; Hybrid gate dielectric; Organic inorganic materials

Indexed keywords

CAPACITORS; COUPLING AGENTS; DIELECTRIC MATERIALS; DIELECTRIC PROPERTIES; ELECTRON MICROSCOPES; ELECTRON MICROSCOPY; FLEXIBLE ELECTRONICS; GATE DIELECTRICS; LOW-K DIELECTRIC; METAL INSULATOR BOUNDARIES; MIM DEVICES; MOLAR RATIO; NANOSTRUCTURED MATERIALS; SILICA; SILICON OXIDES; SOL-GEL PROCESS;

FTIR MEASUREMENTS; FUNCTION OF FREQUENCY; HYBRID FILM; METAL INSULATOR METALS; METHYL METHACRYLATES; MODIFIED SOL-GEL PROCESS; ORGANIC-INORGANIC HYBRID FILMS; ORTHOSILICATE;

ORGANIC-INORGANIC MATERIALS;

EID: 77951014738     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/MSF.644.25     Document Type: Conference Paper

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