Evidence and analysis of parallel growth mechanisms in Cu2O films prepared by Cu anodization

Electrochimica Acta

Volumn 55, Issue 14, 2010, Pages 4353-4358

  Caballero Briones, F ^a,b   Palacios Padros A ^a   Calzadilla, O ^c   Sanz, Fausto ^a,b,d  

^a UNIVERSITY OF BARCELONA   (Spain)

^b BIOMATERIALES Y NANOMEDICINA CIBER BBN   (Spain)

^c UNIVERSITY OF HAVANA   (Cuba)

^d INSTITUTE FOR BIOENGINEERING OF CATALONIA IBEC   (Spain)

Author keywords

Anodic films; Band gap; Cuprous oxide; Dissolution; Growth mechanism; Reflectance; Thickness; Urbach tail parameter

Indexed keywords

ANODIC FILMS; BAND GAPS; CUPROUS OXIDE; GROWTH MECHANISMS; URBACH TAIL;

ATOMIC FORCE MICROSCOPY; COALESCENCE; DISSOLUTION; ENERGY GAP; FILM PREPARATION; GRAIN GROWTH; MECHANISMS; METALLIC FILMS; NUCLEATION; OXIDE FILMS; REFLECTION;

COPPER;

EID: 77950930023     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.10.031     Document Type: Article

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