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Volumn , Issue , 2009, Pages 889-892

Wafer dicing process optimization and characterization for C90 low-k wafer technology

Author keywords

[No Author keywords available]

Indexed keywords

CONTINUOUS IMPROVEMENTS; CRITICAL PROCESS PARAMETERS; CUT DEPTH; CUT QUALITY; DEVICE RELIABILITY; ELECTRICAL TESTS; EXPERIMENTAL STUDIES; MACHINING PARAMETERS; MECHANICAL DICING; METAL DENSITY; ON CURRENTS; OPTICAL MICROSCOPES; PRODUCTION ENVIRONMENTS; SEM; SPINDLE ROTATION; TEST WAFERS; VISUAL INSPECTION; WAFER DICING; WAFER TECHNOLOGY; WORST CASE; YIELD LOSS;

EID: 77950927104     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/EPTC.2009.5416419     Document Type: Conference Paper
Times cited : (4)

References (1)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.