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Volumn , Issue , 2009, Pages 889-892
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Wafer dicing process optimization and characterization for C90 low-k wafer technology
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Author keywords
[No Author keywords available]
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Indexed keywords
CONTINUOUS IMPROVEMENTS;
CRITICAL PROCESS PARAMETERS;
CUT DEPTH;
CUT QUALITY;
DEVICE RELIABILITY;
ELECTRICAL TESTS;
EXPERIMENTAL STUDIES;
MACHINING PARAMETERS;
MECHANICAL DICING;
METAL DENSITY;
ON CURRENTS;
OPTICAL MICROSCOPES;
PRODUCTION ENVIRONMENTS;
SEM;
SPINDLE ROTATION;
TEST WAFERS;
VISUAL INSPECTION;
WAFER DICING;
WAFER TECHNOLOGY;
WORST CASE;
YIELD LOSS;
CHARACTERIZATION;
DESIGN OF EXPERIMENTS;
ELECTRONICS PACKAGING;
FOCUSED ION BEAMS;
MACHINING;
MACHINING CENTERS;
OPTIMIZATION;
REGRESSION ANALYSIS;
RELIABILITY ANALYSIS;
SCANNING ELECTRON MICROSCOPY;
VISUAL COMMUNICATION;
ANALYSIS OF VARIANCE (ANOVA);
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EID: 77950927104
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/EPTC.2009.5416419 Document Type: Conference Paper |
Times cited : (4)
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References (1)
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