Effect of potassium hydrogen phthalate (C8H5KO4) on the one-step electrodeposition of single-phase CuInS2 thin films from acidic solution

Electrochimica Acta

Volumn 55, Issue 15, 2010, Pages 4428-4435

  Xu, Xinhua ^a   Wang, Feng ^a   Liu, Jingjun ^a   Ji, Jing ^a  

^a BEIJING UNIVERSITY OF CHEMICAL TECHNOLOGY   (China)

Author keywords

C8H5KO4 additive; Copper indium disulfide; One step electrodeposition; Reaction mechanism

Indexed keywords

ACIDIC SOLUTIONS; BAND GAPS; CATHODE SURFACE; CODEPOSITION; CONCENTRATION OF; CONTROLLABLE GROWTH; COPPER INDIUM DISULFIDE; ELECTRO REDUCTION; ELECTRODE POTENTIALS; ELECTROLYTIC BATHS; ELECTROLYTIC SOLUTION; POLARIZATION ANALYSIS; POTASSIUM HYDROGEN PHTHALATE; REACTION MECHANISM; SEM; SOLUTION SYSTEM; SYNERGETIC EFFECT; UV-VIS-NIR; XRD;

ADSORPTION; COPPER; COPPER COMPOUNDS; ELECTROCHEMICAL CORROSION; ELECTRODEPOSITION; ESTERS; INDIUM; POLARIZATION; POTASSIUM; SCANNING ELECTRON MICROSCOPY; SULFUR; THIN FILMS; X RAY DIFFRACTION;

ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY;

EID: 77950863127     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2010.02.077     Document Type: Article

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