Growth of transition-metal-doped ZnO films by plasma-enhanced CVD combined with RF sputtering

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 9, 2008, Pages 3125-3127

  Yamaoka, K ^a   Terai, Y ^a   Yamaguchi, T ^a   Fujiwara, Y ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

C-AXIS ORIENTATIONS; METAL-DOPED; PLASMA-ENHANCED CVD; RF GENERATORS; RF-POWER; RF-SPUTTERING; TEMPERATURE ANNEALING; TM-DOPED; TUBE SHAPE; ZNO; ZNO FILMS; ZNO NANOSTRUCTURES;

CHEMICAL VAPOR DEPOSITION; CHROMIUM; METALLIC FILMS; OXIDE FILMS; PLASMA DEPOSITION; SEMICONDUCTOR GROWTH; STAINLESS STEEL; X RAY DIFFRACTION; ZINC;

ZINC OXIDE;

EID: 77950851042     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200779282     Document Type: Conference Paper

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