Evaluation of emission uniformity of nanocrystalline silicon planar cathodes

Journal of Vacuum Science and Technology B

Volumn 28, Issue 2, 2010, Pages

  Shimawaki, Hidetaka ^a   Murakami, Katsuhisa ^b   Neo, Yoichiro ^c   Mimura, Hidenori ^c   Wakaya, Fujio ^b   Takai, Mikio ^b  

^a HACHINOHE INSTITUTE OF TECHNOLOGY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONS; FIELD EMISSION; FIELD EMISSION DISPLAYS; FIELD EMISSION MICROSCOPES; GOLD; LASER ABLATION; MOS DEVICES; NANOCRYSTALS; OXIDE FILMS; OXIDE SEMICONDUCTORS; PLATINUM; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; THIN FILMS;

COLD CATHODES; DIODE STRUCTURE; DIRECTIONAL EMISSION; EMISSION AREA; EMISSION UNIFORMITY; METAL OXIDE SEMICONDUCTOR; PLANAR CATHODES; PLANAR TYPES; SEMICONDUCTOR TUNNELING; THIN-FILM DIODE;

FIELD EMISSION CATHODES;

EID: 77950571845     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3271165     Document Type: Conference Paper

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