|
|
Volumn 19, Issue 5-6, 2010, Pages 397-403
|
|
Microwave analysis of PACVD diamond deposition reactor based on electromagnetic modelling
|
|
Author keywords
Electromagnetic modelling; MW engineering; MW plasma reactor
|
|
Indexed keywords
ANALYSIS METHOD;
COUPLING SYSTEMS;
CVD REACTORS;
DIAMOND DEPOSITION REACTOR;
DIAMOND FILM DEPOSITION;
ELECTRIC FIELD STRUCTURES;
ELECTROMAGNETIC MODELLING;
GEOMETRICAL CONFIGURATIONS;
HIGH-QUALITY DIAMOND FILMS;
MATERIAL QUALITY;
MICROWAVE DESIGNS;
MICROWAVE PLASMA-ASSISTED CVD;
NANOCRYSTALLINES;
ORDER OF MAGNITUDE;
PLASMA IGNITION;
PLASMA INSTABILITIES;
PLASMA REACTORS;
PROCESS PERFORMANCE;
PROCESS STABILITY;
QUARTZ WINDOWS;
RAPID GROWTH;
REDUCED PRESSURE;
RESONANT CAVITY;
RESONANT MODE;
CAVITY RESONATORS;
CHEMICAL VAPOR DEPOSITION;
DIAMOND DEPOSITS;
DIAMOND FILMS;
DIAMONDS;
ELECTRIC FIELDS;
ELECTROMAGNETIC FIELDS;
MAGNETIC FIELD EFFECTS;
MICROWAVES;
OXIDE MINERALS;
PLASMA DEPOSITION;
PLASMA DEVICES;
PLASMA DIAGNOSTICS;
PLASMAS;
QUARTZ;
PLASMA STABILITY;
|
|
EID: 77950370564
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/j.diamond.2009.10.032 Document Type: Article |
|
Times cited : (23)
|
|
References (8)
|
