Simple tuning rules for fractional PI controllers

ETFA 2009 - 2009 IEEE Conference on Emerging Technologies and Factory Automation

Volumn , Issue , 2009, Pages

  Gude, Juan J ^a   Kahoraho, Evaristo ^a  

^a UNIVERSITY OF THE BASQUE COUNTRY UPV EHU   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

IN-PROCESS CONTROL; MAXIMUM SENSITIVITY; OBJECTIVE FUNCTIONS; PI CONTROL; PI CONTROLLER; PROCESS DYNAMICS; STEP RESPONSE EXPERIMENT; THREE PARAMETERS; TUNING RULES;

FACTORY AUTOMATION; SEMICONDUCTOR QUANTUM DOTS; TUNING;

PROCESS CONTROL;

EID: 77949901189     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ETFA.2009.5347157     Document Type: Conference Paper

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