Ferromagnetic Fe3N films grown on GaN(0 0 0 2) substrates by MOCVD

Journal of Crystal Growth

Volumn 312, Issue 9, 2010, Pages 1525-1528

  Tao, Z K ^a   Cui, X G ^a   Zhang, R ^a   Xiu, X Q ^a   Xie, Z L ^a   Zheng, Y D ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

A3. MOCVD; B2. Iron nitride; B2. SQUID; B3. Spin injection

Indexed keywords

B2. IRON NITRIDE; FE-IONS; IRON NITRIDES; IRON PARTICLES; METALORGANIC CHEMICAL VAPOR DEPOSITION; MOCVD; SPIN-INJECTION;

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; GALLIUM NITRIDE; GROWTH TEMPERATURE; IRON COMPOUNDS; MAGNETIC MOMENTS; METALLIC FILMS; QUANTUM INTERFERENCE DEVICES; SCANNING ELECTRON MICROSCOPY; SPIN DYNAMICS; X RAY PHOTOELECTRON SPECTROSCOPY;

GALLIUM ALLOYS;

EID: 77949893621     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2009.12.042     Document Type: Article

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