RF-sputtered Ge-ITO nanocomposite thin films for photovoltaic applications

Solar Energy Materials and Solar Cells

Volumn 94, Issue 5, 2010, Pages 797-802

  Shih, G H ^a   Allen, C G ^a   Potter Jr , B G ^a  

^a University of Arizona   (United States)

Author keywords

Ge; ITO; Nanocomposite; Photovoltaic; Thin films

Indexed keywords

ABSORPTION ONSET; BAND GAPS; DEPOSITION CONTROL; FUNCTIONAL ELEMENTS; INTERFACIAL PHASE; ITO; LENGTH SCALE; MAGNETRON SPUTTER DEPOSITION; MATRIX; MULTISOURCES; NANO-COMPOSITE STRUCTURE; NANOCOMPOSITE THIN FILMS; NANOCRYSTALLINE PHASE; NANOCRYSTALLITE SIZE; OPTICAL ABSORPTION; PHASE ASSEMBLIES; PHOTOVOLTAIC APPLICATIONS; PHOTOVOLTAIC PERFORMANCE; PHOTOVOLTAIC THIN FILMS; POST-DEPOSITION; SEMICONDUCTOR NANOSTRUCTURES; SPATIAL DISTRIBUTION; SPECTRAL ABSORPTIONS; THERMAL ANNEALS; TIN DOPED INDIUM OXIDE;

ABSORPTION; DEPOSITION; ELECTRON AFFINITY; GERMANIUM; GERMANIUM OXIDES; INDIUM COMPOUNDS; NANOCOMPOSITES; OPTICAL PROPERTIES; OXIDE FILMS; THIN FILMS; TIN; TITANIUM COMPOUNDS; TRANSPORT PROPERTIES;

ITO GLASS;

EID: 77949658497     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2009.12.026     Document Type: Article

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