|
Volumn 312, Issue 8, 2010, Pages 1188-1192
|
Atmospheric pressure chemical vapour deposition of electrochromic Mo-W thin oxide films: Structural, optoelectronic and vibration properties
|
Author keywords
A1. Characterization; A1. Crystal structure; A1. Surface structure; A3. Chemical vapour deposition processes; B1. Oxides
|
Indexed keywords
A1. CHARACTERIZATION;
A1. CRYSTAL STRUCTURE;
A3. CHEMICAL VAPOUR DEPOSITION PROCESSES;
B1. OXIDES;
CHEMICAL VAPOUR DEPOSITION;
AMORPHOUS FILMS;
ATMOSPHERIC CHEMISTRY;
ATMOSPHERIC PRESSURE;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL STRUCTURE;
ELECTROCHROMISM;
FIELD EMISSION;
FIELD EMISSION MICROSCOPES;
FILM PREPARATION;
MOLYBDENUM;
MOLYBDENUM OXIDE;
OXIDES;
OXYGEN;
PROTECTIVE COATINGS;
PYROLYSIS;
RAMAN SPECTROSCOPY;
SCANNING ELECTRON MICROSCOPY;
SURFACE MORPHOLOGY;
THERMOGRAVIMETRIC ANALYSIS;
TRANSITION METAL COMPOUNDS;
TRANSITION METALS;
TUNGSTEN;
X RAY PHOTOELECTRON SPECTROSCOPY;
OXIDE FILMS;
|
EID: 77949610091
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2010.01.001 Document Type: Article |
Times cited : (16)
|
References (15)
|