Far-field measurement of ultra-small plasmonic mode volume

Optics Express

Volumn 18, Issue 6, 2010, Pages 6048-6055

  Zhang, Shuang ^a   Park, Yong Shik ^a   Liu, Yongmin ^a   Zentgraf, Thomas ^a   Zhang, Xiang ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; PLASMONS;

ELECTRIC FIELD DISTRIBUTIONS; EXPERIMENTAL DETERMINATION; FAR FIELD; FAR FIELD MEASUREMENT; FIELD DISTRIBUTION; INTERACTION STRENGTH; LIGHT-MATTER INTERACTIONS; MODE VOLUME; NANO SCALE; OPTICAL FORCE; OPTICAL MODES; RELIABLE MEASUREMENT; ULTRA-SMALL;

NEAR FIELD SCANNING OPTICAL MICROSCOPY;

ARTICLE; COMPUTER SIMULATION; METHODOLOGY; RADIATION DOSE; RADIOMETRY; SURFACE PLASMON RESONANCE; THEORETICAL MODEL;

COMPUTER SIMULATION; MODELS, THEORETICAL; RADIATION DOSAGE; RADIOMETRY; SURFACE PLASMON RESONANCE;

EID: 77949596344     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.006048     Document Type: Article

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