Redistribution of elements in glass induced by a high-repetition-rate femtosecond laser

Optics Express

Volumn 18, Issue 6, 2010, Pages 6262-6269

  Luo, Fangfang ^a,b   Qian, Bin ^a,b   Lin, Geng ^a,b   Xu, Jian ^a,b   Liao, Yang ^a,b   Song, Juan ^c   Sun, Haiyi ^a   Zhu, Bin ^d   Qiu, Jianrong ^d   Zhao, Quanzhong ^a   Xu, Zhizhan ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

^c JIANGSU UNIVERSITY   (China)

^d ZHEJIANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORESCENCE; GLASS; PULSED LASER APPLICATIONS; ULTRASHORT PULSES; YTTERBIUM;

CROSS SECTION; ELECTRON MICROPROBE ANALYZERS; ELEMENTAL DISTRIBUTION; ELEMENTAL REDISTRIBUTION; FEMTO-SECOND LASER; FLUORESCENCE INTENSITIES; FLUORESCENCE SPECTRA; HIGH REPETITION RATE; INCIDENT BEAMS; KHZ FEMTOSECOND LASER; LASER PROPAGATION; MULTICOMPONENTS; NETWORK MODIFIERS; OXY-FLUORIDE GLASS; RELATIVE CONCENTRATION; SPHERICAL ABERRATIONS;

GLASS LASERS;

GLASS;

ARTICLE; CHEMISTRY; LASER; MATERIALS TESTING; RADIATION EXPOSURE;

GLASS; LASERS; MATERIALS TESTING;

EID: 77949580586     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.006262     Document Type: Article

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