Silicon solar cells textured by low damage RIE with natural lithography

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2002, Pages 324-327

  Manshanden, P ^a   Burgers, A R ^a   Nositschka, W A ^b   Voigt, O ^b   Weeber, A W ^a  

^a TNO   (Netherlands)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FAILURE ANALYSIS; LITHOGRAPHY; OPTIMIZATION; REACTIVE ION ETCHING; SURFACES; TEXTURES;

AUTOMASKING; MULTICRYSTALLINE SILICON SOLAR CELLS; NATURAL LITHOGRAPHY;

SILICON SOLAR CELLS;

EID: 0036954031     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

1. H.F.W. Dekkers et al, RIE surface texture for light trapping on thin film solar cells, 17th EU-PVSEC 2001
2. M. Schenell et al, "Plasma surface texturization for multicrystalline solar cells", 28th IEEE PVSC 2000, pp 367-370
3. D.S. Ruby et al, "Plasma texturization for multicrystalline solar cells," 28th IEEE PVSC 2000, pp 75-79
4. K. Shirasawa et al, "Over 17% large area multicrystalline silicon solar cells", 14th EU PVSEC 1997, pp 384-387
5. A.R. Burgers et al. "Silicon solar cells textured by reactive ion etching with natural lithography", 16th EU PVSEC 2000, pp 1427-1430
6. W.A. Nositschka, et al. "Texturisation of Multicrystalline Silicon Wafers for Solar Cells by Reactive Ion Etching through Colloidal Masks", accepted on March 6, 2002 for Sol.Energy.Mater. Sol. Cells
7. www.statgraphics.com
8. W.A. Nositschka, et al. "Industrial applicable Texturisation by plasma etching of mc-Si Solar Cells - Evaluation and Prevention of plasma damage", to be published