Applications of atomic emission spectrum from liquid electrode discharge to metal ion detection

Guang Pu Xue Yu Guang Pu Fen Xi/Spectroscopy and Spectral Analysis

Volumn 30, Issue 2, 2010, Pages 537-542

  Mao, Xiu Ling ^a   Wu, Jian ^a   Ying, Yi Bin ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Electrolyte cathode; Liquid electrode; Metal ion; Plasma

Indexed keywords

ACADEMIC FIELDS; ACTIVE METALS; ANODIC STRIPPING VOLTAMMETRY; ATOMIC ABSORPTION SPECTRA; ATOMIC EMISSION SPECTRA; CAPILLARY DISCHARGES; DETECTING LIMIT; DETECTING TECHNOLOGY; DISCHARGE SYSTEMS; ELECTRODE METALS; LIQUID ELECTRODES; METAL ION DETECTION; PLASMA PRODUCTION;

ABSORPTION SPECTROSCOPY; ATOMIC SPECTROSCOPY; ATOMS; ELECTROLYSIS; ELECTROLYTES; EMISSION SPECTROSCOPY; ION SELECTIVE ELECTRODES; LIQUIDS; MAGNESIUM; MERCURY (METAL); METAL IONS; METALS; PLASMAS; RESEARCH; STRIPPING (DYES);

ELECTRIC DISCHARGES;

EID: 77949559637     PISSN: 10000593     EISSN: None     Source Type: Journal    
DOI: 10.3964/j.issn.1000-0593(2010)02-0537-06     Document Type: Article

References (49)

1. Wang J, Lu J, Hocevar S B, et al. Anal. Chem., 2000, 72: 3218.
2. Sunka P. Physics of Plasmas, 2001, 8(5): 2587.
3. Modi A, Koratkar N, Lass E, et al. Nature, 2003, 424: 171.
4. Zimmermann S, Wischhusen S, Müller J. Sensors and Actuators B, 2000, 63: 159.
5. Miller R A, Nazarov E G, Eiceman G A, et al. Sensors and Actuators A, 2001, 91: 301.
6. Zhang W, Fisher T S, Garimella S V. Journal of Applied Physics, 2004, 96(11): 6066.
7. Ye Jing, Yuan Qing, Yu Jing, et al. Chinese Journal of Sensors and Actuators, 2008, 21(10): 1669.
8. Miclea M, Franzke J. Plasma Chemistry and Plasma Processing, 2007, 27(2): 205.
9. Wang Y Q, Cal A L, Sun R X, et al. 8th International Conference on Electronic Measurement and Instruments, Xi'an, China, 16-18, August, 2007. 577.
10. Cserfalvi T, Mezeit P, Apai P. J. Phys. D: Appl. Phys., 1993, 26: 2184.
11. Cserfalvi T, Mezeit P. J. Anal. At. Spectrom., 2003, 18: 596.
12. Park Y S, Ku S H, Kim H J, et al. Spectrochimica Acta Part B, 1998, 53: 1167.
13. Cserfalvi T, Mezei P. J. Anal. At. Spectrom., 1994, 9: 345.
14. Cserfalvi T, Mezei P. Fresenius J. of Anal. Chem., 1996, 355: 813.
15. Mezei P, Cserfalvi T, Jónossy M. J. Anal. At. Spectrosc., 1997, 12: 1203.
16. Mezei P, Cserfalvi T, Jónossy M. J. Phys. D: Appl. Phys., 1998, 31: L41.
17. Jenkins G, Manz A. Journal of Micromechanics and Microengineering, 2002, 12: N19.
18. Kim H J, Lee J H, Kim M Y, et al. Spectrochim. Acta, Part B, 2000, 55B: 823.
19. Titov V A, Rybkin V V, Maximov A I, et al. Plasma Chemistry and Plasma Processing, 2005, 25(5): 503.
20. Mezei P, Cserfalvi T. J. Phys. D: Appl. Phys., 2006, 39: 2534.
21. Yagov V V, Gentsina M L. J. Anal. Chem., 2004, 59: 64.
22. Yagov V V, Gentsina M L, Zuev B K. J. Anal. Chem., 2004, 59: 1037.
23. Mezei P, Cserfalvi T, Csillag L. Journal of Physics D: Applied Physics, 2005, 38: 2804.
24. Jenkins G, Franzke J, Manz A. Lab-on-a-Chip, 2005, 5: 711.
25. Webb M R, Andrade F J, Gamez G, et al. J. Anal. At. Spectrom., 2005, 20: 1218.
26. Mottaleb M A, Woo Y A, Kim H J. Microchem. J. 2001, 69: 219.
27. Webb M R, Andrade F J, Hieftje G M. Analytical Chemistry, 2007, 79(20): 7899.
28. Webb M R, Andrade F J, Hieftje G M. Analytical Chemistry, 2007, 79(20): 7807.
29. Zhu Z L, Chan G C Y, Ray S J. Analytical Chemistry, 2008, 80(18): 7043.
30. Marcus R K, Davis W C. Anal. Chem., 2001, 73: 2903.
31. Davis W C, Marcus R K. Spectrochimica Acta Part B, 2002, 57: 1473.
32. Venzie J L, Marcus R K. Anal. Bioanal. Chem., 2005, 381: 96.
33. Davis W C, Marcus R K. J. Anal. At. Spectrom., 2001, 16: 931.
34. Que L, Wilson C G, Gianchandani Y B. Journal of Microelectromechanical System, 2005, 14(2): 185.
35. Faure G, Shkolnik S M. J. Phys. D: Appl. Phys., 1998, 31: 1212.
36. Andre P, Barinov Y, Faure G, et al. J. Phys. D: Appl. Phys., 2001, 34: 3456.
37. Andre P, Aubreton J, Barinov Y, et al. J. Phys. D: Appl. Phys., 2002, 35: 1846.
38. Wilson C G, Gianchandani Y B. IEEE Trans. Electron Devices, 2002, 49: 2317.
39. De Baerdemeaker F, Monte M, Leys C. IEEE Transaction on Plasma Science, 2005, 33: 492.
40. De Baerdemaeker F, Simek M, Leys C. Journal of Physics D-Applied Physics, 2007, 40(9): 2801.
41. De Baerdemaeker F, Simek M, Leys C, Verstraete W. Plasma Chemistry and Plasma Processing, 2007, 27(4): 473.
42. De Baerdemaeker F, Simek M, Schmidt J, Leys C. Plasma Sources Science & Technology, 2007, 16(2): 341.
43. Nikiforov A Y, Leys C. Plasma Sources Science & Technology, 2007, 16(2): 273.
44. Wu J, Yu J, Li J, et al. Spectrochimica Acta Part B, 2007, 62: 1269.
45. Wilson C G, Gianchandani Y B. Proc. IEEE Int. Conf. MEMS, 2002, 248.
46. Lim J, Reyes D R, Manz A. Lap Chip, 2003, 3: 137.
47. Jenkins G, Manz A. Proc. Micro Total Analysis Systems, 2001. 349.
48. Karanassios V. Spectrochimica Acta Part B, 2004, 59: 909.
49. Miclea M, Kunze K, Franzke J, et al. Spectrochim. Acta Part B, 2002, 57: 1585.