Selective growth of carbon nanotubes using catalyst poisoning and geometric trench

Journal of Materials Science: Materials in Electronics

Volumn 21, Issue 1, 2010, Pages 16-19

  Chang, Wen Teng ^a  

^a NATIONAL UNIVERSITY OF KAOHSIUNG   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM THIN FILMS; FERROMAGNETIC PARTICLES; GEOMETRIC FEATURE; MULTI-WALL CARBON NANOTUBES; SELECTIVE GROWTH; THERMAL CHEMICAL VAPOR DEPOSITION;

ALUMINUM COATINGS; CARBON NANOTUBES; DEPOSITION; FILM GROWTH; GEOMETRY; MULTIWALLED CARBON NANOTUBES (MWCN); THIN FILMS;

CATALYST POISONING;

EID: 77949424548     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-009-9862-y     Document Type: Article

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