Carbon nitride polymers sensitized with N-doped tantalic acid for visible light-induced photocatalytic hydrogen evolution

Journal of Physical Chemistry C

Volumn 114, Issue 9, 2010, Pages 4100-4105

  Li, Qiuye ^a   Yue, Bing ^a,b   Iwai, Hideo ^a   Kako, Tetsuya ^a,b   Ye, Jinhua ^a,b  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b HOKKAIDO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION EDGES; ACID RED; AQUEOUS METHANOL SOLUTIONS; AQUEOUS SOLUTIONS; ENERGY DISPERSIVE X-RAY SPECTROMETRY; GOOD STABILITY; HYDROGEN EVOLUTION; N-DOPED; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC HYDROGEN EVOLUTION; PHOTOGENERATED CHARGE CARRIERS; PROTONIC ACIDITY; PYROGENATION; REFLECTANCE SPECTRUM; VISIBLE LIGHT; VISIBLE LIGHT REGION;

ACIDS; AZO DYES; CARBON NITRIDE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDRATES; METHANOL; POLYVINYL ALCOHOLS; RECONNAISSANCE AIRCRAFT; UREA; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYMERS;

EID: 77949303562     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp911803z     Document Type: Article

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