Transverse superresolution and focal shift with rotational tunable phase mask

Optics Communications

Volumn 283, Issue 10, 2010, Pages 2079-2083

  Yun, Maojin ^a   Liang, Wei ^b   Kong, Weijin ^a   Gao, Xiumin ^c   Zhu, Huafeng ^d   Liang, Jian ^a  

^a QINGDAO UNIVERSITY   (China)

^b UNIVERSITY OF JINAN   (China)

^c HANGZHOU DIANZI UNIVERSITY   (China)

^d CHINA UNIVERSITY OF PETROLEUM   (China)

Author keywords

Focal shift; Rotational symmetric polarization pupil mask; Superresolution

Indexed keywords

APODIZERS; FOCAL DEPTH; FOCAL PLANE; FOCAL SHIFT; FOCAL SHIFTS; HALF-WAVE; IMAGING CHARACTERISTICS; NUMERICAL RESULTS; OPTICAL IMAGING SYSTEM; OPTIMIZED SYSTEM; PHASE MASKS; PUPIL MASK; QUARTER WAVE-PLATE; SUPER RESOLUTION; TRANSVERSE RESOLUTION; TRANSVERSE SUPERRESOLUTION;

NUMERICAL ANALYSIS; OPTICAL RESOLVING POWER; OPTICAL SYSTEMS; OPTOELECTRONIC DEVICES; POLARIZATION;

FOCUSING;

EID: 77949271556     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2010.01.039     Document Type: Article

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