High aspect ratio constructive nanolithography with a photo-dimerizable molecule

Langmuir

Volumn 26, Issue 5, 2010, Pages 3623-3628

  Barczewski, Matthias ^a,b   Walheim, Stefan ^a,b   Heiler, Tobias ^a,b   Błaszczyk, Alfred ^a,c   Mayor, Marcel ^a,d   Schimmel, Thomas ^a,b  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b UNIVERSITY OF KARLSRUHE   (Germany)

^c POZNA UNIVERSITY OF ECONOMICS AND BUSINESS   (Poland)

^d UNIVERSITY OF BASEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPES; DISULFIDE BONDS; HIGH ASPECT RATIO; LATERAL RESOLUTION; MULTISTEP PROCESS; NANOGRAFTING; PHOTO-INDUCED; PHOTODIMERIZATION; SINGLE-STEP PROCESS; SURFACE INITIATED POLYMERIZATION;

MONOLAYERS; NANOLITHOGRAPHY; POLYMERS; PRESSURE DROP;

ASPECT RATIO;

EID: 77749320883     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la903028x     Document Type: Article

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