Plasma density measurements by phase resolved cutoff

Applied Physics Letters

Volumn 96, Issue 8, 2010, Pages

  Kwon, J H ^a   You, S J ^a   Kim, J H ^a   Shin, Y H ^a  

^a Korea Research Institute of Standards and Science   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON DENSITIES; PHASE DIFFERENCE; PLASMA FREQUENCIES; PRECISE MEASUREMENTS; TIME MODULATION;

ANTENNAS; CARRIER CONCENTRATION; ELECTRON DENSITY MEASUREMENT; PLASMA DENSITY; PLASMA WAVES;

ELECTRONS;

EID: 77749270639     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3332477     Document Type: Article

References (7)

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2. J. -H. Kim, S. -C. Choi, Y. -H. Shin, and K. -H. Chung, Rev. Sci. Instrum. RSINAK 0034-6748 75, 2706 (2004). 10.1063/1.1771487
3. S. J. You and J. H. Kim, "Physics of Capacitive Plasmas," invited talk in Korean Physical Society (2008).
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6. L. E. Frenzel, Jr., RF Power for Industrial Applications (Pearson, Upper Saddle River, NJ, 2004).
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