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Volumn 10, Issue 4, 2010, Pages 2838-2843

Towards optimization of time modulated chemical vapour deposition for nanostructured diamond films on Ti6Al4V

Author keywords

Diamond film; Optimisation; Raman spectroscopy; Residual stresses; Surface finish; Ti6Al4V; TMCVD

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; DEPOSITED FILMS; DIAMOND GROWTH; EXPERIMENTAL PARAMETERS; FILM CHARACTERISTICS; FILM SURFACES; MICRO-RAMAN SPECTRA; NANOSTRUCTURED DIAMOND FILMS; NUMBER OF SAMPLES; OPTIMISATION; OPTIMISATIONS; SEM ANALYSIS; SPECIMEN SURFACES; SURFACE FINISHES; TI-6AL-4V;

EID: 77749243695     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2010.1456     Document Type: Conference Paper
Times cited : (6)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.