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Volumn 7, Issue 2, 2010, Pages 248-255

The model for oxidation kinetics of titanium nitride coatings

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION PROCESS; EXPERIMENTAL DATA; NEW MODEL; OXIDATION BEHAVIORS; OXIDATION KINETICS; OXIDATION PROCESS; PHYSICAL MEANINGS; RATE-CONTROLLING; TIN COATING; TITANIUM NITRIDE COATING;

EID: 77649245672     PISSN: 1546542X     EISSN: 17447402     Source Type: Journal    
DOI: 10.1111/j.1744-7402.2008.02342.x     Document Type: Article
Times cited : (12)

References (12)
  • 1
    • 0001763005 scopus 로고
    • Oxidation and degradation of titanium nitride ultrafine powders exposed to air
    • Y. Sakka, S. Ohno M. Uda Oxidation and Degradation of Titanium Nitride Ultrafine Powders Exposed to Air J. Am. Ceram. Soc., 75 244 248 (1992).
    • (1992) J. Am. Ceram. Soc. , vol.75 , pp. 244-248
    • Sakka, Y.1    Ohno, S.2    Uda, M.3
  • 2
    • 0041916129 scopus 로고
    • The preparation and characterization of optical thin films produced by ion-assisted deposition
    • P. J. Martin, R. P. Netterfield, W. G. Sainty C. G. Pacey The Preparation and Characterization of Optical Thin Films Produced by Ion-Assisted Deposition J. Vac. Sci. Technol. A, 2 341 345 (1984).
    • (1984) J. Vac. Sci. Technol. A , vol.2 , pp. 341-345
    • Martin, P.J.1    Netterfield, R.P.2    Sainty, W.G.3    Pacey, C.G.4
  • 3
    • 36749119083 scopus 로고
    • High-temperature contact structures for silicon semiconductor devices
    • M. Wittmer High-Temperature Contact Structures for Silicon Semiconductor Devices Appl. Phys. Lett., 37 540 542 (1980).
    • (1980) Appl. Phys. Lett. , vol.37 , pp. 540-542
    • Wittmer, M.1
  • 4
    • 0019633490 scopus 로고
    • Oxidation kinetics of TiN thin films
    • M. Wittmer, J. Noser H. Mechior Oxidation Kinetics of TiN Thin Films J. Appl. Phys., 52 [11] 6659 6664 (1981).
    • (1981) J. Appl. Phys. , vol.52 , Issue.11 , pp. 6659-6664
    • Wittmer, M.1    Noser, J.2    Mechior, H.3
  • 5
    • 0035806064 scopus 로고    scopus 로고
    • Thermal stability of TiN thin film investigated by DTG/DTA
    • I. G. Polyakova T. Hübert Thermal Stability of TiN Thin Film Investigated by DTG/DTA Surf. Coat. Technol., 141 55 61 (2001).
    • (2001) Surf. Coat. Technol. , vol.141 , pp. 55-61
    • Polyakova, I.G.1    Hübert, T.2
  • 7
    • 0001408260 scopus 로고
    • The oxidation of metals in high temperature
    • N. B. Pilling R. E. Bedworth The Oxidation of Metals in High Temperature J. Inst. Met., 29 529 582 (1923).
    • (1923) J. Inst. Met. , vol.29 , pp. 529-582
    • Pilling, N.B.1    Bedworth, R.E.2
  • 8
    • 0000760090 scopus 로고
    • On the theory of scaling reactions
    • C. Wagner On the Theory of Scaling Reactions Z. Phys. Chem. B, 21 25 42 (1933).
    • (1933) Z. Phys. Chem. B , vol.21 , pp. 25-42
    • Wagner, C.1
  • 9
    • 84982381804 scopus 로고
    • Reactions in the solid state at high temperatures
    • W. Jander Reactions in the Solid State at High Temperatures Z. Anorg. U. Allgem. Chem., 163 1 30 (1927).
    • (1927) Z. Anorg. U. Allgem. Chem. , vol.163 , pp. 1-30
    • Jander, W.1
  • 10
    • 33646684058 scopus 로고    scopus 로고
    • A kinetic model for oxidation of Si-Al-O-N materials
    • K. C. Chou A Kinetic Model for Oxidation of Si-Al-O-N Materials J. Am. Ceram. Soc., 89 [5] 1568 1576 (2006).
    • (2006) J. Am. Ceram. Soc. , vol.89 , Issue.5 , pp. 1568-1576
    • Chou, K.C.1
  • 11
    • 11344287155 scopus 로고    scopus 로고
    • Kinetics of absorption and desorption of hydrogen in alloy powder
    • K. C. Chou, Q. Li, Q. Lin, L. J. Jiang K. D. Xu Kinetics of Absorption and Desorption of Hydrogen in Alloy Powder Int. J. Hydrogen Energ., 30 301 309 (2005).
    • (2005) Int. J. Hydrogen Energ. , vol.30 , pp. 301-309
    • Chou, K.C.1    Li, Q.2    Lin, Q.3    Jiang, L.J.4    Xu, K.D.5
  • 12
    • 53349101725 scopus 로고    scopus 로고
    • Comparison of the diffusion control models for isothermal oxidation of Si-Al-O-N powders
    • X. M. Hou K. C. Chou Comparison of the Diffusion Control Models for Isothermal Oxidation of Si-Al-O-N Powders J. Am. Ceram. Soc. 91 10 3315 3319 (2008).
    • (2008) J. Am. Ceram. Soc. , vol.91 , Issue.10 , pp. 3315-3319
    • Hou, X.M.1    Chou, K.C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.