Epitaxial growth of high quality cubic MgZnO films on MgO substrate

Journal of Crystal Growth

Volumn 312, Issue 7, 2010, Pages 875-877

  Wang, L K ^a,b   Ju, Z G ^a,b   Shan, C X ^a   Zheng, J ^a,b   Li, B H ^a   Zhang, Z Z ^a   Yao, B ^a   Zhao, D X ^a   Shen, D Z ^a   Zhang, J Y ^a  

^a CHANGCHUN INSTITUTE OF OPTICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

A1. Cubic structure A1. Atomic force microscopy; A1. Smooth surface; A1. X ray diffraction; A3. Metalorganic chemical vapor deposition; B2. MgZnO films

Indexed keywords

A1. CUBIC STRUCTURE A1. ATOMIC FORCE MICROSCOPY; A3.METALORGANIC CHEMICAL VAPOR DEPOSITION; B2. MGZNO FILMS; CUBIC STRUCTURE; SMOOTH SURFACE;

ATOMIC FORCE MICROSCOPY; ATOMS; DIFFRACTION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; METALLORGANIC VAPOR PHASE EPITAXY; OPTOELECTRONIC DEVICES; SINGLE CRYSTALS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC;

EPITAXIAL FILMS;

EID: 77249119739     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2010.01.009     Document Type: Article

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