Bias-current modulation technique of a radio-frequency glow discharge plasma for atomic emission analysis associated with a fast Fourier transform analyzer

Microchemical Journal

Volumn 95, Issue 1, 2010, Pages 107-112

  Wagatsuma, Kazuaki ^a   Urushibata, Satomi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Bias current modulation; Copper; Fast Fourier transform analyzer; Glow discharge plasma; Iron based alloy; Optical emission spectrometry

Indexed keywords

EID: 76849085823     PISSN: 0026265X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microc.2009.11.007     Document Type: Article

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