Influence of powder properties and plasma spray conditions on erosion resistance of yttrium oxide coatings against halogen plasma for dry etching process in semiconductor and electronic applications

Proceedings of the International Thermal Spray Conference

Volumn , Issue , 2009, Pages 541-546

  Ibe, H ^a   Sato, K ^a   Yuasa, F ^a   Mizuno, H ^a   Kitamura, J ^a  

^a FUJIMI INCORPORATED RandD Center   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHAMBER WALLS; COATING PROPERTIES; DEVICE INTEGRATION; DRY ETCHING PROCESS; ELECTRONIC APPLICATION; ELECTRONIC DEVICE; EROSION PROPERTIES; EROSION RESISTANCE; FINE POWDERS; HALOGEN PLASMAS; PARTICLE GENERATION; PLASMA SPRAY; POWDER PROPERTIES; PRIMARY PARTICLE SIZE; PROCESS PARAMETERS; PRODUCTION EFFICIENCY; SINTERED POWDERS;

ALUMINUM COATINGS; DRY ETCHING; MECHANICAL PROPERTIES; PLASMA ETCHING; PLASMA JETS; PLASMA SPRAYING; PLASMAS; POWDER COATINGS; PROTECTIVE COATINGS; SEMICONDUCTOR DEVICES; SHIELDING; SINTERING; YTTRIUM; YTTRIUM OXIDE;

YTTRIUM ALLOYS;

EID: 76649145683     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1361/cp2009itsc0541     Document Type: Conference Paper

References (6)

1. Status and Perspective of Thermal Spray Markets 2004, Digital Research Institute Inc. (Nagoya, Japan), 2004 p. 20-33, in Japanese.
2. Y. Kobayashi, Current Status and Needs in the Future of Ceramics Used for Semiconductor Production Equipment, Proc. 37th Seminar on High-Temperature Ceramics, (Osaka, Japan), Japan Ceramics Society, 2005, p. 1-7, in Japanese.
3. R. Ohtsuki, Publication of Japanese Patent Application, 2001-226773.
4. J. Kitamura, H. Mizuno, N. Kato and I. Aoki, Ceramic Coatings Prepared by Plasma Spraying for Semiconductor Production Equipments, Mater. Trans., 2006, 47(7), p. 1677-1683
5. J. Kitamura, H. Mizuno, H. Ibe and I. Aoki, Erosion Properties of Plasma Sprayed Ceramic Coatings Against Process Plasma in Semiconductor Production Equipment, Proc International Thermal Spray Conference 2007, (Beijing, China), ASM International, 2007, p. 943-947
6. J. Kitamura, H. Ibe F. Yuasa and H. Mizuno, Plasma Sprayed Coatings of High Purity Ceramics for Semiconductor and Flat-Panel-Display Production Equipment, J. Thermal Spray Technol., 17(5-6), 2008, p 495-501.