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Volumn 45, Issue 3, 2010, Pages 295-299
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Controlled etching of hexagonal ZnO architectures in an alcohol thermal process
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Author keywords
A. Oxides; B. Crystal growth; D. Crystal structure; D. Defects
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Indexed keywords
A. OXIDES;
ALCOHOL THERMAL;
ALCOHOL-THERMAL PROCESS;
B. CRYSTAL GROWTH;
CHEMICAL ACTIVITIES;
CHEMICAL ETCHING;
CONTROLLED GROWTH;
CRYSTALLOGRAPHIC CHARACTERISTICS;
D. CRYSTAL STRUCTURE;
D. DEFECTS;
FORMAMIDES;
HIGH DENSITY;
MICRODISKS;
MICRORINGS;
NEW OPPORTUNITIES;
PLANAR DEFECT;
POLAR SURFACES;
SELECTIVE ETCHING;
SHAPE CONTROLLED SYNTHESIS;
STRUCTURED MATERIALS;
SURFACE POLARITIES;
WURTZITES;
ZNO;
AMIDES;
CRYSTAL GROWTH;
CRYSTALLIZATION;
ETCHING;
GRAIN BOUNDARIES;
SURFACE DEFECTS;
SURFACES;
ZINC;
ZINC OXIDE;
ZINC SULFIDE;
CRYSTAL STRUCTURE;
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EID: 76349120822
PISSN: 00255408
EISSN: None
Source Type: Journal
DOI: 10.1016/j.materresbull.2009.12.010 Document Type: Article |
Times cited : (38)
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References (21)
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