Microstructure-mechanical and chemical behavior relationships in passive thin films

Thin Solid Films

Volumn 518, Issue 10, 2010, Pages 2757-2763

  Yassar, R S ^a   Scudiero, L ^b   Alamr, A S ^c   Bahr, D F ^c   Norton, M G ^c  

^a Michigan Technological University   (United States)

^b WASHINGTON STATE UNIVERSITY   (United States)

^c Washington State University   (United States)

Author keywords

Nanoindentation; Passive films; Stainless steel; Transmission electron microscopy; X ray photoelectron spectroscopy

Indexed keywords

ALLOY CHEMISTRY; AMORPHOUS MATRICES; CHEMICAL BEHAVIOR; FRACTURE LOAD; IRON CONTENT; LOWER ENERGIES; MECHANICAL BEHAVIOR; METALLIC ELEMENTS; NANOINDENTATION TESTS; PASSIVE FILMS; SMALL-CRYSTALLINE;

AUSTENITIC STAINLESS STEEL; CHROMIUM; CORROSION RESISTANT ALLOYS; ELECTRONS; EPITAXIAL FILMS; FRACTURE; IRON; METALLIC COMPOUNDS; MICROSTRUCTURE; OXIDE FILMS; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; STRESS CORROSION CRACKING; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 76049123247     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.08.032     Document Type: Article

References (34)

1. Macdonald D.D., and Urquidi-Macdonald M. J. Electrochem. Soc. 17 (1990) 2395
2. Olsson C.-O.A., and Landolt D. Electrochim. Acta 48 (2003) 1093
3. Colson J.C., and Larpin J.P. MRS Bull. 10 (1994) 23
4. Li J.X., Chu W.Y., Wang Y.B., and Qiao L.J. Corros. Sci. 45 (2003) 1355
5. Latanision R.M., and Staehle R.W. Acta Metall. 17 (1969) 307
6. Bubar S.F., and Vermilyea D.A. J. Electrochem. Soc. 114 (1967) 882
7. Kolman D.G., Gaudett M.A., and Scull J.R. J. Electrochem. Soc. 145 (1998) 1829
8. Oliver W.C., and Pharr G.M. J. Mater. Res. 7 (1992) 1564
9. Bahr D.F., Kramer D.E., and Gerberich W.W. Acta Mater. 46 (1998) 3605
10. Pang M., Eakins D.E., Norton M.G., and Bahr D.F. Corrosion 57 (2001) 523
11. Mudali U.K., and Katada Y. Electrochim. Acta 46 (2001) 3735
12. Rodriguez-Marek D., Pang M., and Bahr D.F. Metall. Mater. Trans. A 34 (2003) 1291
13. Alamr A., Bahr D.F., and Jacroux M. Corros. Sci. 48 (2006) 925
14. Alamr A., Bahr D.F., and Jacroux M. Corros. Eng. Sci. Technol. 40 (2005) 255
15. Stoychev D., Stefanov P., Nickolova D., Valov I., and Marinova T. Mater. Chem. Phys. 73 (2002) 252
16. Chiba M., and Seo M. Corros. Sci. 44 (2002) 2379
17. Seo M., and Chiba M. Electrochim. Acta 47 (2001) 319
18. Hermas A.A., Nakayama M., and Ogura K. Electrochim. Acta 50 (2005) 2001
19. Beccaria A.M., Castello G., and Poggi G. Br. Corros. J. 4 (1995) 283
20. Clayton C.R., and Lu Y.C. J. Electochem. Soc. 133 (1986) 2465
21. Cimino A., DeAngelis B.A., Luchetti A., and Minelli G. J. Catal. 45 (1976) 316
22. Okamoto Y., Fujii M., Imanaka T., and Teranishi S. Bull. Chem. Soc. Jpn. 49 (1976) 859
23. Olefjord I., and Wegrelius L. Corros. Sci. 31 (1990) 89
24. Kirchheim R., Heine B., Hofmann S., and Hofsass H. Corros. Sci. 31 (1990) 573
25. Wegrilius L., Falkenberg F., and Olefjord I. J. Electrochem. Soc. 146 (1999) 1397
26. Hanawalt J.D., Rinn W.H., and Frevel K.L. Anal. Chem. 10 (1938) 475
27. Rao J.C., Zhang X., Qin B., and Fung K.K. Philos. Mag. Lett. 83 (2003) 395
28. Cabrera N., and Mott N. Rep. Prog. Phys. 12 (1948) 163
29. Chao C.Y., Lin L.F., and Macdonald D.D. J. Electrochem Soc. 128 (1981) 1187
30. Macdonald D.D. Pure Appl. Chem. 71 (1999) 951
31. Haupt S., and Strehblow H. Corros. Sci. 37 (1995) 43
32. Belo M.C., Walls M., Hakiki N.E., Corset J., Picquenard E., Sagon G., and Noël D. Corros. Sci. 40 (1998) 447
33. Hones P., and Lovy F. J. Mater. Res. 14 (1999) 3623
34. Venkataraman S., Kohlstedt D., and Gerberich W.W. J. Mater. Res. 8 (1993) 685